Please use this identifier to cite or link to this item: http://hdl.handle.net/2381/43125
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dc.contributor.authorKarim, Wrya O.-
dc.contributor.authorAbbott, Andrew P.-
dc.contributor.authorCihangir, Salih-
dc.contributor.authorRyder, Karl S.-
dc.date.accessioned2019-01-10T16:31:25Z-
dc.date.issued2018-07-18-
dc.identifier.citationTransactions of the Institute of Metal Finishing, 2018, 96 (4), pp. 200-205en
dc.identifier.issn0020-2967-
dc.identifier.urihttps://www.tandfonline.com/doi/full/10.1080/00202967.2018.1470400en
dc.identifier.urihttp://hdl.handle.net/2381/43125-
dc.descriptionThe file associated with this record is under embargo until 12 months after publication, in accordance with the publisher's self-archiving policy. The full text may be available through the publisher links provided above.en
dc.description.abstractElectropolishing is a common method for decreasing surface roughness and removing surface irregularities. In this paper the electropolishing of nickel and cobalt are successfully demonstrated in a deep eutectic solvent, comprising a 2:1 molar mixture of ethylene glycol and choline chloride. Voltammetric and electrochemical impedance studies were used to characterise the polishing mechanism and show that film formation occurs prior to polishing. Scanning electron microscopy and atomic force microscopy were used to characterise the morphology before and after polishing and 3D optical microscopy was used in-situ to observe film formation during polishing. This study shows that the impact of film formation and subsequently mass transport are responsible for electropolishing of both metals in the choline chloride-based ionic liquid.en
dc.language.isoenen
dc.publisherTaylor & Francis for Institute of Metal Finishingen
dc.relation.urihttp://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000452206900009&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8c4e325952a993be76947405d4bce7d5-
dc.rightsCopyright © 2018 Institute of Materials Finishing Published by Taylor & Francis on behalf of the Institute. Deposited with reference to the publisher’s open access archiving policy. (http://www.rioxx.net/licenses/all-rights-reserved)en
dc.subjectScience & Technologyen
dc.subjectPhysical Sciencesen
dc.subjectTechnologyen
dc.subjectElectrochemistryen
dc.subjectMetallurgy & Metallurgical Engineeringen
dc.subjectMaterials Science, Coatings & Filmsen
dc.subjectMaterials Scienceen
dc.subjectDeep eutectic solventen
dc.subjectelectropolishingen
dc.subjectnickelen
dc.subjectcobalten
dc.subjectfilm formationen
dc.subjectAC impedanceen
dc.subjectvoltammetryen
dc.subjectionic liquiden
dc.subjectSTAINLESS-STEELen
dc.subjectMECHANISMen
dc.titleElectropolishing of nickel and cobalt in deep eutectic solventsen
dc.typeJournal Articleen
dc.identifier.doi10.1080/00202967.2018.1470400-
dc.identifier.eissn1745-9192-
dc.description.statusPeer-revieweden
dc.description.versionPost-printen
dc.type.subtypeArticle;Journal-
pubs.organisational-group/Organisationen
pubs.organisational-group/Organisation/COLLEGE OF SCIENCE AND ENGINEERINGen
pubs.organisational-group/Organisation/COLLEGE OF SCIENCE AND ENGINEERING/Department of Chemistryen
dc.rights.embargodate2019-07-18-
dc.dateaccepted2018-04-15-
Appears in Collections:Published Articles, Dept. of Chemistry

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